B. Wayne Bequette is a Professor of Chemical and Biological Engineering at Rensselaer Polytechnic Institute and with the Mount Sinai-RPI Center for Engineering in Precision Medicine (CEPM). His development and use of data analytics, machine learning, modeling and control algorithms and techniques have been applied to a variety of challenging problems including automation and control of monoclonal antibodies processing, pharmaceutical pilot plants, bioreactors, insulin delivery for people with type 1 diabetes, and large-scale chemical and steel manufacturing. A current focus is on developing process systems engineering techniques for autologous cell & gene therapy.

Professor Bequette is the author of over 125 refereed journal publications and two textbooks published by Prentice Hall – (i) Process Control: Modeling, Design and Simulation, 2nd ed. (2024), and (ii) Process Dynamics: Modeling, Analysis and Simulation (1998). He serves as Board Secretary for the American Automatic Control Council and is a Trustee of the Computer Aids for Chemical Engineering (CACHE) Corporation. Dr. Bequette is a founding member of the Editorial Board of the Journal of Diabetes Science and Technology and serves on the Editorial Board of Industrial & Engineering Chemistry Research. He is a Fellow of IEEE, AIChE and the American Institute of Medical and Biological Engineers and was inducted into the Arkansas Academy of Chemical Engineers. He is an avid bicyclist (commuting to campus in upstate NY throughout the entire year) and pole-vaulter (Master’s level competition refers more to age than skill level).